Abstract
This paper describes methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs with photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals.
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