Probe Diagnostics of Microwave Plasma at Frequency 2.45 GHz in CW and Pulse Regime

Abstract

AbstractThe paper is focused on diagnostics of newly developed surfatron‐based plasma source working at frequency 2.45 GHz. This plasma source of jet type can be operated in cw as well as in PC controlled pulse regime. We carried out diagnostic of the plasma exiting the nozzle by single and double Langmuir probe in cw as well as in pulsed regime of plasma source operation. The basic plasma parameters ‐ electron density and electron temperature ‐ are estimated from single probe measurements at low pressures. The electron temperature in wide range of pressures is evaluated from double probe measurements. Time evolution of electron temperature along a single period in pulsed mode of operation is measured and discussed. The exiting plasma stream is directly applied on a plastic material sample (PE) with the aim to increase its hydrophility. Degree of hydrophility is characterized by contact angle measurements. Relations between process plasma parameters and results of contact angle measurements are discussed. (© 2006 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)