Abstract
Primary-ion charge neutralization by means of negative ion bombardment, conductive film coating, and conductive layer induced by sputtering has been investigated for the purpose of developing secondary ion mass spectrometry (SIMS) analysis of insulators. It has been found that negative ion bombardment reduces charge accumulation on a specimen, while the conductive film and layer play a subordinate role in charge neutralization. In SIMS analysis of insulators, however, the conductive film is required to provide the extraction field for secondary ions in combination with charge neutralization by negative ion bombardment.
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