Pressure-dependent Ni–O phase transitions and Ni oxide formation on Pt(111): An in situ STM study at elevated temperatures

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Growth, atomic structure and O2 partial pressure dependent phase transitions of Ni-O structures and thin NiO films on Pt(111) have been studied using scanning tunnelling microscopy (STM), low-energy electron diffraction (LEED), and Auger electron spectroscopy (AES). In situ STM experiments were performed during film growth by reactive metal deposition at elevated temperatures (400-550 K) and variable O2 pressure. Depending on the substrate temperature, one-dimensional network-like Ni-O structures and islands with (7x1) and (4x2) reconstructions are formed during the initial stages of growth. These structures transform reversibly to a (2x2) reconstruction in a narrow O2 pressure range of 1.5-2x10(-6) mbar and can be monitored by in situ STM. Upon reduction of the O2 pressure to <10(-10) mbar pseudomorphic Ni monolayers are obtained. The defect-free ordering of Ni atoms on Pt(111) in a single stacking domain indicates an O-surfactant induced growth mode. The structural properties of the O2 pressure-dependent Ni-O phases are discussed in a simple model assuming NiO(001)-like atomic arrangements in the adsorbate overlayer. At higher coverage stable (111)-oriented NiO islands grow in a three-dimensional mode.