Abstract
The physics and technology for e-beam generation, large volume excitation and the ultra-violet optics for high power KrF lasers is presented. The potential, due to the charge deposition, induces a return current in the plasma which balances the e-beam current. The local equilibrium mechanism stabilizes the large volume excitation using intense electron beams. The spatial and temporal characteristics of large aperture diodes are analyzed. Substantial progress in ultra violet optics in Japan has been achieved. The damage threshold of HR dielectric coating increases up to 11 J/cm2 by using low absorption materials.
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