Abstract
Thin titanium carbide films were prepared by ion beam sputtering of titanium and graphite targets followed by thermal annealing at 600 °C in vacuum and irradiation by Ar+ ions up to a fluence of 1015 ions/cm2. The stoichiometry of the films was analyzed by RBS and NRA methods, it was found to be Ti2.2C. The crystalline structure of the films was analyzed by STEM and EELS microscopic methods: before irradiation it was mostly amorphous with crystalline parts and visible network of micro-voids, crystallization and formation of laminar structure was observed after irradiation. The irradiated part showed corrugated surface morphology and a dense network of nano-openings. The thickness of the films increased from ca 67 nm to ca 83 nm. Obviously, the effect of the ion irradiation promoted the recrystallization and self-organization of the structure, resulting in the nano-laminar phase of Ti2C.
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