Abstract
The precursor solution was prepared with copper acetate (Cu(OAc)2) as the start material, acrylic acid (AA) as the chemical modifier, and absolute methanol (MEOH) as the solvent. AA reacted with Cu(OAc)2 to form the copper complex with the photosensitivity. In the complex, Cu ion is coordinated with two hydroxy oxygen atoms of AA. The coated gel film using this precursor solution exhibited photosensitivity to UV light at around 245nm. Based on the photosensitivity, the patterned CuO film was fabricated.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
