Photosensitive YBCO gel film and its patterning by sol–gel process

Abstract

The YBCO precursor solution was prepared using yttrium acetate, barium acetate and copper acetate as starting material, diethylenetriamine, trifluoroacetate, acrylic acid (AA) as chemical additives, methanol as solvent. The precursor solution was modified by AA, in which the Cu 2+ of Cu(OAc) 2 and AA were reacted to form the photosensitive copper complex. The coated gel film using this precursor solution exhibited the photosensitivity to UV light at around 245 nm. Utilizing the photosensitivity, the patterned YBCO film with a high critical transition temperature ( Tc) of 91.5 K was fabricated.