Abstract
An oxyfluoride glass with good thermal stability (Delta T=313.72 degrees C), high transmittance and excellent 3m laser induced damage threshold (LIDT) was prepared by a high temperature melting technique. The oxyfluoride glass has an optical transmittance as high as 91.2% (without AR coatings) at 351 nm and the transmission is stable in the successive laser shots. Its 3 omega LIDT is higher than that of fused silica, and the corresponding mechanism has been discussed through SEM microstructure and damage morphology observation. This novel oxyfluoride glass makes itself a promising candidate material used in 3 omega high power laser system. (C) 2013 Published by Elsevier Ltd.
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