Abstract
A novel oxyfluoride glass (OFG) was prepared. The laser induced damage threshold (LIDT) of the novel OFG is 24.9% higher than fused silica under 355nm nanosecond laser irradiation by R-on-1 procedure. Characterization by optical microscope and scanning electron microscope shows that the initial damage morphologies of two kind of materials are significantly different. Experiment results indicate that the novel OFG can be a good candidate component material for high energy laser applications.
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