Abstract
To seek the possible formation of positively charged plasma films the chemical composition of plasma films formed from organosilicones containing nitrogen (hexamethyldisilazane (HMDSZ), trimethylsilyldimethylamine (TMSDMA) and a mixture of tetramethylsilane and NH 3) was analysed by elemental analysis and IR spectroscopy, and quaternization of these films with methyl bromide was carried out. IR spectroscopic and electron spectroscopy for chemical analysis studies revealed that the plasma films from TMSDMA and the TMS-NH 3 mixture were successfully quaternized but those from HMDSZ were not. This indicates that the structural characteristics of the starting compounds exert a powerful influence on the polymer-forming process. The quaternized plasma films prepared from TMSDMA were used to prepare moisture sensor devices.
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