Abstract
AbstractColorless, transparent, and filmy polymers prepared from mixtures of tetramethylsilane (TMS) and ammonia gas (NH3) were investigated by elemental analysis, infrared (IR) spectroscopy, and ESCA. These polymers contained a large amount of nitrogen residues in the form of amine, amide, and amine oxide groups. Their concentration varied with the composition of the starting TMS/NH3 mixtures. The mixing of NH3 gas with TMS influenced the chemical state of Si residues and accelerated the oxidation of Si atoms to form silicon oxides such as SiO, Si2O3, and SiO2. The polymers formed by glow discharge polymerization in the TMS/NH3 mixtures were combinations of Si‐ and N‐containing polymers and silicon oxides.
Published Version
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