Preparation of porous Fe2O3/SiO2 nanocomposite abrasives and their chemical mechanical polishing behaviors on hard disk substrates

Abstract

Abrasives play an important role in chemical mechanical polishing (CMP) processes. Compact solid silica particles, which have been widely used as abrasive in CMP slurries, may cause surface defects because of their high hardness. Porous silica abrasive exhibits better surface planarization and fewer scratches than traditional solid silica abrasive during the polishing of hard disk substrates. However, the improvement in material removal rate (MRR) was not significant. Therefore, porous Fe2O3/SiO2 nanocomposite abrasives were prepared and their CMP performances on hard disk substrates were investigated. Experiment results indicate that the MRR of slurry containing porous Fe2O3/SiO2 nanocomposite abrasives is obviously higher than that of slurry containing pure porous silica abrasive under the same testing conditions. MRR increases with the increase of the molar content of iron in porous Fe2O3/SiO2 nanocomposite abrasives. Moreover, surfaces polished by slurries containing the porous Fe2O3/SiO2 nanocomposite abrasives exhibit lower surface roughness, fewer scratches as well as lower topographical variations than that by pure porous silica abrasive.