Preparation of Silica / Alumina Composite Abrasives and Their CMP Behavior on Hard Disk Substrate

Abstract

Abrasives are one of the key influencing factors on the surface quality during chemical mechanical polishing (CMP). a-alumina particles, as a kind of widely used abrasives in CMP slurries, often cause surface defects due to their high hardness and agglomeration. In this paper, silica / alumina composite abrasives were prepared by co-precipitation and characterized by means of XRD, XPS, TOF-SIMS and SEM. Further, the CMP performances of alumina/silica abrasives on hard disk substrate were investigated by using a SPEED FAM-16B-4M CMP equipment. After polishing, the slurry containing the prepared abrasives gives much lower topographical variations.