Abstract
The monolayer behaviors of poly(N-alkylmethacrylamides) with various pendant substituents, octyl (POMA), dodecyl (PDDMA), tetradecyl (PTDMA), hexadecyl (PHDMA), or octadecyl (PODMA), on the water surface and the properties of the Langmuir−Blodgett (LB) films were investigated. Among those polymers, PTDMA formed the most stable condensed monolayer. The PTDMA monolayer can be transferred successively onto solid supports such as quartz, glass, and silicon slide, giving Y-type uniform polymer LB films. It was found that PTDMA LB film could be effectively decomposed by deep UV irradiation and produced directly a positive fine pattern with high resolution without any development process. The sensitivity of the PTDMA LB film was remarkably enhanced with decreasing number of layers. This lithographic property of the LB film is expected to be applicable to a new type of positive photoresist for a deep UV excimer laser.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
