Preparation of Na-β-alumina films by laser chemical vapor deposition

Abstract

This study demonstrates the growth of Na-β-alumina films by laser chemical vapor deposition and investigates the effects of deposition temperature (Tdep), molar ratio of Na/Al (RNa/Al) and total pressure (Ptot) on the phase formation, microstructure, orientations and deposition rate (Rdep) of the film. Single-phase Na-β-alumina films were deposited at (Tdep)=1310K–1360K, RNa/Al>20 and Ptot>600Pa. Na-β-alumina films with the hexagonally faceted platelet morphology were deposited at Ptot=1000Pa, whereas flake-like grains were formed at Ptot=600Pa. Na-β-alumina was co-deposited with α-Al2O3 at Ptot<600Pa and Tdep>1350K, in which the film morphology showed flake-like grains with smaller granules. The maximum Rdep of Na-β-alumina films was 44μmh−1.