Abstract
As LiNbO3 is one of the best materials for optical and SAW devices, the preparation of lithium niobate (LiNbO3) thin films on many different substrates has been widely investigated. However, the growth of high-quality LiNbO3 films with desired orientation on the amorphous substrates such as SiO2 is very difficult. In this study, sputtered LiNbO3 films were deposited under the external bias electric field in order to fabricate the oriented films. It was found that c-axis oriented LiNbO3 thin films could be obtained on SiO2/Si substrates by this bias sputtering method. Moreover, it was revealed that the films had pyroelectricity from pyroelectric measurement.
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