Abstract
Low surfactant/silicon molar ratio synthesis systems were investigated for the preparation of a high thermal stability mesoporous molecular sieve MCM-41. Tetraethyl orthosilicate containing cetyltrimethylammonium bromide (CTAB) and NaOH were used to prepare synthesis gel which was analyzed by XRD diffractograms and N adsorption isotherms. The XRD patterns exhibited high-intensity peaks.
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