Abstract
Structures and soft magnetic properties of (Fe/Fe-N)/(Si-O, -N) duplex structure multilayered films were studied. The films were prepared by alternation of Fe RF-sputtering, N2 plasma nitridation and Si-O and Si-N electron cyclotron resonance (ECR) plasma chemical vapor deposition (CVD). Magnetic multilayers of Fe/Fe-N were magnetically isolated by 1 to 5 layers of nonmagnetic Si-O, -N to advance high-frequency permeability. High-frequency permeability was increased by lamination of Si-N layers, but Si-O lamination deteriorated soft magnetic properties of the Fe/Fe-N multilayers by oxygen contamination during the Si-O deposition process. At optimum lamination structure of (Fe/Fe-N)/(Si-N), µ′>3500 (20 MHz) was obtained.
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