Abstract
Using modernized three-electrode ion-plasma sputtering, homogeneous thin films of Fe-Si-B-(Cu, Nb), and Fe-Si-B-(Ni, Mo) were obtained. The structure of the films was investigated by X-ray diffraction and electron microscopy. It was established that as a result of sputtering, amorphous and nanocrystalline phases with a coherent scattering region (CSR) size of 1.6 nm and 12 nm were formed in the Fe73Si16B7-(Cu, Nb)4 and Fe78.5Si6B14-(Ni, Mo)1.5 films. The thermal stability of metastable states of the films, as well as theelectrical and magnetic properties of freshly prepared and heat-treated films were studied. The conditions for obtaining films with small (modulo) values of the temperature coefficient of electrical resistance ( - 0.9∙10-5 K-1) and coercive force (HC ~ 11 A/m) were determined.
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