Abstract
Nanoporous niobium oxide thin film with wormhole pore structure is prepared by combining a dip-coating method and an evaporation-induced self-assembly (EISA) technique. The template of nanopore and inorganic source used are commercially available neutral block copolymer P85, HO(CH 2 CH 2 O) 26 (CH 2 CH(CH 3 )O) 39 (CH 2 -CH 2 O) 26 H, and niobium pentachloride. The crystallized nanoporous niobium oxide film is successfully fabricated by a two-step calcination process: the first calcination process removes the template and forms a nanoporous film with amorphous framework, and the second calcinations step crystallizes the framework with random pore originated from the voids among the single crystalline domains. Scanning electron microscopy (SEM) reveals that the obtained material is a crack-free nanoporous film with the thickness of c.a. 200–300 nm. The crystal oxide framework and nanoporous structure is characterized by x-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis in details.
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