Abstract
This research aims to build cheaply homemade DC magnetron sputtering system for deposit metal thin films on substrate by assist of polymer mask photolithography. The metal thin film is able to use as a hard mask for patterning transfer via chemical wet etching or plasma dry etching process and it also can be used as a metal electrode in micrometre scale. Prepared copper thin films will be measured thickness by scanning electron microscope. Crystalline structure of the thin films will be examined by x-ray diffractometer. Elemental analysis contained in the films will be determined by energy dispersive x-ray spectrometer and morphology of the films will be revealed by scanning electron microscope.
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