Abstract
AbstractA comparative photodestruction study was carried out on solid state copolymers of styrene with methyl vinyl ketone, methyl isopropenyl ketone, phenyl vinyl ketone, benzalacetone and benzalacetophenone. The photolysis of the examined copolymers was found to proceed rapidly higher destruction rates being observed with increasing the ketone concentration. The rate of light‐induced destruction for the first three copolymers was markedly greater than that of the styrene‐benzalacetone and styrene‐benzalacetophenone copolymers. The photodestruction proceeds probably by the Norrish II mechanism.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
