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Abstract
BiFeO3 (BFO) thin films with various Bi/Fe ratios have been deposited on SrRuO3/SrTiO3(001) substrates by dual ion beam sputtering. A Bi2O3 ceramic disk and an α-Fe2O3 powder disk were used as targets, and simultaneously sputtered using a dual ion beam. Bi/Fe ratio has been controlled by adjusting the beam current ratio on the Bi2O3- and α-Fe2O3-side ion sources. Even a BFO thin film with a Bi/Fe ratio of 0.95 and a smooth surface shows a slightly leaky characteristic. [Fe2+]/([Fe3+]+[Fe2+]) ratio has been estimated by Auger electron spectroscopy (AES). From the AES profiles, the [Fe2+]/([Fe3+]+[Fe2+]) ratio of the BFO thin film with a Bi/Fe ratio of 0.95 is estimated to be 0.14. It is considered that not only improving surface roughness but also enhancing oxidization is important for reduction in leakage current.
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