Abstract
The facing targets type of sputtering (FTS) apparatus [Naoe, Yamanaka, and Hoshi, IEEE Trans. Magn. MAG-16, 646 (1986)] can prepare amorphous Tb-Fe-Co thin films on plasma-free substrates at temperatures lower than 100 °C at a deposition rate as high as 5000 Å/min. The saturation Kerr rotation at 830 nm, reflectance and coercive force of the specimen films 1000 Å thick were 0.3, 48%, and 6 kOe, respectively, comparable to those obtained in films deposited at a one-hundredth lower rate by conventional rf diode and dc magnetron sputtering. Films with good uniformity of thickness, composition, and characteristics were deposited over the whole area of 12-in. disk substrates made of PMMA or glass, without deteriorating the pregrooves. At this stage, a C/N of about 46 dB has been attained.
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