Abstract
AbstractPlasma polymerizations of bis(dimethylamino)methylsilane (BDMAMVS), bis(dimethylamino) methylvinylsilane (BDMAMVS), and trimethylsilyldimethylamine (TMSDMA) were investigated by elemental analysis, IR spectroscopy, and ESCA. Polymer deposition was fairly faster in the BDMAMVS and TMSDMA systems than in the BDMAMS system, indicating that vinyl and methyl substituents contribute to polymer formation, whereas hydrogen substituents disturb the polymer formation. IR and ESCA spectra for these polymers showed that some dependence of the polymers formed in the chemical composition on the nature of the monomers. A part of methylamino groups in these monomers were oxidized to give amido and amine oxide groups. BDMAMVS and TMSDMA yielded polymers with few fragmentations of methylamino groups, whereas the polymers formed from BDMAMS had no methylamino groups.
Published Version
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