Preparation by MOCVD and characterization by AFM of the (1 1 9) oriented Bi-2223 thin films

Abstract

Orientation control of high T c superconductors is essential for superior device performance, because the coherence length is longer along the non- c-axis directions than along c-axis direction. In this study, we report on successful preparation of (1 1 9) oriented Bi 2Sr 2Ca 2Cu 3O 10 (Bi-2223) films by metalorganic chemical vapor deposition using (1 1 0) SrTiO 3 substrates. Atomic force microscopy observations of the (1 1 9) Bi-2223 films are reported for the first time. Our films have an in-plane aligned mountain-range-shaped surface morphology. This morphology is resulting from the epitaxial relationship between the (1 1 9) Bi-2223 film and (1 1 0) substrate. The obtained films exhibited a large in-plane anisotropy as revealed by resistivity measurements and surface morphology observations.