Optimization of large magnetoresistance of polycrystalline Bi film

Abstract

The oriented growth and morphology of polycrystalline bismuth (Bi) films deposited on insulating substrates is investigated based on the molecular beam epitaxy method. The film thickness effect on the resistance-temperature characteristics and magnetoresistance properties is analyzed. The Bi film resistivity with thickness range [25, 65] nm is investigated using the four-probe method at 2–300 K. The magnetic field contributes to opening the energy gap of Bi thin films and a more obvious opening of the energy gap is observed in the thinner films. The Bi film has the weak antilocalization (WAL) effect and the thickness increase affects the WAL effect. The large magnetic field is beneficial to the observation of the WAL effect. The temperature-dependent resistivity of Bi thin films is described based on the Ziman-Faber theory. The competition between the metal surface state and the bulk state explains the semimetal-semiconductor transition and the magnetoresistance effect in the thickness range [25, 65] nm. In addition, the thickness effect on the magnetoresistance property is researched, which provides a new approach to specify the Bi thin film magnetoresistance.