Abstract
In order to further study the relationship between sorption properties of ZrCoCe thin films and magnetron sputtering process parameters, ZrCoCe getter films were deposited on the Si(100) substrate by DC magnetron sputtering. In this paper, background vacuum, sputtering pressure and sputtering power as experimental variables were discussed in detail. The surface and cross section microstructure and phase of the film were determined by scanning electron microscopy (SEM) and H2 sorption measurement of films was carried out by a dynamic sorption method. It is demonstrated that porous columnar structure film can be achieved under the conditions of the background degree less than 5.0×10-4 Pa, sputtering pressure is 4 Pa and sputtering power is 120 W. As a result of the optimization of the porous columnar structure, the sorption properties of the films are also improved.
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