Preparation and promising optoelectronic applications of lead halide perovskite patterned structures: A review

Abstract

AbstractLead halide perovskites have received considerable attention from researchers over the past several years due to their superior optical and optoelectronic properties, because of which they can be a versatile platform for fundamental science research and applications. Patterned structures based on lead halide perovskites have much more novel properties compared with their more commonly seen bulk‐, micro‐, and nano‐crystals, such as improvement in antireflection, light‐scattering effects, and light absorption, as a result of their adjustability of spatial distributions. However, there are many challenges yet to be resolved in this field, such as insufficient patterned resolution, imperfect crystal quality, complicated preparation process, and so on. To pave the way to solve these problems, we provide a systematic presentation of current methods for fabricating lead halide perovskite patterned structures, including thermal imprint, use of etching films, two‐step vapor‐phase growth, template‐confined solution growth, and seed‐assisted growth. Furthermore, the advantages and disadvantages of these methods are elaborated in detail. In addition, thanks to the extraordinary properties of lead halide perovskite patterned structures, a variety of potential applications in optics and optoelectronics of these structures are described. Lastly, we put forward existing challenges and prospects in this exciting field.