Abstract
Niobium-doped ZnO (NZO) transparent conductive films are deposited on glass substrates by rf sputtering at 300° C. Effects of sputtering power on the structural, morphologic, electrical, and optical properties of NZO films are investigated by x-ray diffraction (XRD), field emission scanning electron microscopy (FESEM), Hall measurement, and optical transmission spectroscopy. The obtained films are polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (002) crystallographic direction. The minimum resistivity of 4.0 × 10−4 Ω·cm is obtained from the film grown at the sputtering power of 170 W. The average optical transmittance of the films is over 90%.
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