Abstract
In this study, a novel process for depositing tin oxide thin films by electrodeposition has been developed. Amorphous phase of the as-deposited film was obtained at the temperature of 85°C. Nanocrystalline having tetragonal structure with a grain size in the range of 4 to 7 nm was obtained by heat-treatment at 400°C in a vacuum for 4 h. Porous, dense, and uniform morphologies for the deposits can be obtained by controlling current density during deposition. Results of infrared spectra, X-ray diffraction, scanning electron microscopy, and transmission electron microscopy analyses were described and correlated with the process of deposition and characteristics of the resulting films. © 2002 The Electrochemical Society. All rights reserved.
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