Abstract
Nonionic triblock copolymer P-123 and alkyl poly(oxyethylene) surfactant Brij56 (C 16 EO 10 ) templated silica films were spin coated on p-type silicon (100) wafers. The dielectric constant, leakage current and mechanical strength were measured and found to be dependent on the template removal conditions, pore structure and film properties as characterized by TEM, GIXRD, thin film XRD, XRR and N & K analyses of on-wafer samples.
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