Abstract
Changes in the FeSi(100) surface composition, due the preferential sputtering, have been studied using Ar +, Ne + and Kr + ions in the energy range 300–3000 eV and Auger electron spectroscopy (AES). In the given energy range, silicon was found to be preferentially sputtered by argon, neon and krypton bombardment, this effect being more pronounced at low ion energies. The sputtering yield ratio (density corrected) K si K Fe was not found to be much different at low energies (> 500 eV), but at higher energies, between 500 and 3000 eV, differs considerably for the three projectiles used. The surface composition change depends on the projectile energy. The effects were less pronounced with the mass of the ions. The results are discussed taking into account projectile-to-surface energy transfer effects and energy dissipation through elastic collision cascade in alloys. The main effects come from the mass difference of the target constituent elements and not from the mass difference between projectile and target.
Published Version
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