Abstract
AbstractIn this work the amount of adsorbed oxygen and its chemical bonding configuration to diamond surface were investigated by X‐ray photoelectron spectroscopy (XPS) and high resolution electron energy loss spectroscopy (HR‐EELS), correspondingly. Hot filament chemical vapor deposited polycrystalline diamond films with sub‐micron grain size have been exposed in situ to thermally activated atomic oxygen (AO) and annealed in ultra‐high vacuum (UHV) in the range of 600–1000 °C. XPS studies revealed that substantial oxidation of the diamond surface takes place at TA > 800 °C, most likely owing to partial hydrogen desorption occurring at this temperature. HR‐EELS revealed that the main constituents of the surface after exposure to AO are saturated and unsaturated hydrocarbon species and oxygen‐bonded fragments. Oxygen bonds to diamond surface in ether (COC), peroxide (COOC), and carbonyl (CO) bonding. HR‐EELS features comparison of hydrogenated and oxygen exposed diamond surface as a function of thermal annealing suggests enhanced reactivity of hydrogenated diamond (111) facets as compared to (100) ones.
Published Version
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