Abstract
Based on an analysis of the precision and preparation technology of an optical texture film with a triangular pyramid texture, the technical requirements of the original mold were determined, and precision shaping planning technology was adopted to process the original mold. The shape error of the optical texture mold of the triangular pyramid was assessed by defining the area ratio of the retro-reflection. The influence of the tool nose radius and exit burr on the area ratio of the retro-reflection were analyzed. By optimizing the cutting tools, cutting materials and cutting boundaries, a five-axis ultra-precision machining system was used to plan the triangular pyramid structure with a base length of 115 µm and an included angle between two sides of 70.5°. The experimental results indicate that the dimension error of the triangular pyramid element is less than 1 µm, the angle error of the included angle between two sides is less than 0.05°, and the average roughness of the side of the triangular pyramid can reach 9.2 nm, which satisfies the processing quality requirements of the triangular pyramid texture mold.
Highlights
An optical functional texture film is a surface microarray film that can change the path of light propagation [1]
In 2015, Rahman [8] et al published in Nature Communications that three types of nanoscale tapered light-trapping textures were directly prepared on the surface of a poly(methyl methacrylate) (PMMA) thin film via plasma etching
Our previous research [21] found that by laminating a sub-millimeter-scale optical functional texture film to a smooth surface crystalline silicon cell, as shown in Figure 1, the reflection loss of the cell can be reduced to 13%
Summary
An optical functional texture film is a surface microarray film that can change the path of light propagation [1]. Rahman et al [8] laminated a layer of a flat film to the surface of crystalline silicon and processed a fine conical texture 5 nm in height on the flat film using the ultra-precision ion etching method, which decreases the reflection loss of the composite structure crystalline silicon cells to below 1%. Our previous research [21] found that by laminating a sub-millimeter-scale optical functional texture film to a smooth surface crystalline silicon cell, as shown, the reflection loss of the cell can be reduced to 13%. The embossing process can be used to prepare sub-millimeter-scale optical functional textured films with large area and low cost, and the dimensional accuracy and surface quality of sub-millimeter-scale microstructures can be better controlled. Aresgvaardriionugstehreromrsacohfitnhiengoraicgcinuaral cmyooldf tahree odriirgeicntalyl mtraonldsmarietteimdptoosthede o[2p3t–ic2a5l]f.uAnccctioorndainl tgextotutrheefdilimm,ehnisgihonreaql upirreecmiseionntsarnedgasrudrifnagcethroeumgahcnheisnsinogf tahceculirgahcty-troafppthinegofirilgmin, avliamcoolmdbainreatiiomnpwosiethd th[2e3p–2re5c].isAiocncoorfdeilnegctrtoofotrhme idnigmaenndsieomnablospsriencgi,sitohne sainzed asnudrfsaucerfarcoeupgrhenceissisonofotfhtheelimghictr-tortarpiapnignuglafrilpmy,rvamiaidcoomf tbhineamtioolnd wisidthetethrme ipnreedciassiofnolloofwesle: cTthroefboormttoinmg saindde isema =bo1s1s5in±g3, μthme, sthizeeinacnluddesudrafancgelepbreetcwiseieonntwofo sthideesmisicαro=tr7ia0n.5g◦u±la0r.0p5y◦,rathmeisdurofaf ctehreoumgohlndesiss idseRtearm= i1n0ednmas, faonlldowthse: Tdhime ebnosttioomnasl iddeeviisaatio=n11is l±es3sμtmha,nth3e%in. cTluodaecdhiaenvgelesubcehtwaeehnigthwmo asicdheisniinsgα q=u7a0li.t5y°, ±th0e.0fo5°r,mthinegspurrofacceessrocaungheffneecstsiviselRyad=u1p0licnamte, tahnedshthaepde iomf tehnesicounttaelrdaenvdiaetniosnuries tlhesesdtihmaenn3s%io.nTaol aaccchuireavceysoufchthae hfiingihshmedacphriondinugctq.uality, the forming process can effectively duplicate the shape of the cutter and ensure the dimensional accuracy of the finished product
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