Abstract
Positron annihilation spectroscopy (PAS) as a nondestructive, depth-sensitive probe was applied to study diamondlike nanocomposite (DLN) films. DLN films were deposited from a plasma discharge of polyphenilmetilsiloxane on rf-biased Si substrates. The film properties show systematic changes with variations in the voltage applied to the substrate. The film deposited at an rf bias voltage of 1000 V is stable under a 450 °C anneal. PAS results show that films with the highest breakdown voltage have the highest open-volume regions. Ellipsometric measurements and Raman scattering results from these films are also provided.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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