Positive-type photosensitive polyimide based on a photobase generator containing oxime-urethane groups as a photosensitive compound

Abstract

The chemical structure of a semi-aromatic polyimide-I, which was prepared by the chemical imidization of cyclopentanetetracarboxylic dianhydride and 2,2-bis(4-aminophenyl)hexafluoropropane, was characterized by13C-NMR spectroscopy. The chemically imidized polyimide-I was used for the preparation of a photosensitive polyimide (PSPI)|through the addition of benzophenone and benzophenone oxime hexamethylene diurethane (BOHD), a photobase generator containing oxime-urethane groups. The polyimide-I film containing benzophenone and BOHD was not soluble in 2.38 wt% tetrabutylammonium hydroxide solution in H2O. However, it became soluble following irradiation with 310 nm UV light. A positive tone image with a resolution of 5 μm was obtained with this PSPI, having sensitivity (Dc)|of 1.2 J/cm2 and contrast (γp)|of 1.08. Thus, a polyimide, which is not intrinsically photosensitive, can become photosensitive through the addition of a photobase generator containing oxime-urethane groups as a photosensitive compound.