Abstract
Experimental evidence is presented which indicates that HF attacks preferentially along cracks, pores, or other singularities which exist in anodic tantalum oxide films. These defects when enlarged by the HF etch permit an electrochemical emf to arise. It is discussed how the electrochemical emf affects the photoresponse of tantalum oxide.
Full Text
Published Version (
Free)
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call