Abstract
Abstract Thin-film thermocouples, a crucial technology for accurate temperature measurement, have attracted considerable attention in energy utilization, environmental monitoring, and advanced manufacturing. This paper provides an overview of the evolution of thin-film thermocouples, with a focus on the calibration methods and experimental performance of K-type thermocouples. Utilizing a five-layer film structure that includes a polyimide substrate, aluminum oxide insulation layer, nickel-chromium and nickel-silicon metal films, and a silicon oxide protective layer, we have designed and implemented a new thin-film thermocouple temperature measurement system, which has been experimentally validated for stability and repeatability under high-temperature conditions. The results indicate that the system demonstrates excellent thermoelectric potential output and good repeatability in temperature measurement within the range of 50°C to 250°C. Although the long-term stability in extremely high-temperature environments requires further study, this research provides theoretical and experimental support for the future development of thin-film thermocouple technology.
Published Version
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