Polymerization of organosilicon compounds on a metal surface using a glow discharge

Abstract

THE polymerization of organic compounds on solid surfaces in the presence of a glow discharge was studied earlier [1-4]. Owing to the complexity and variety of the reactions which take place in this process and lead to the formation of polymer surface films, the mechanism and structure had not been studied to any extent. The structure of the films obtained with a glow discharge from benzene or methane was studied by infrared spectroscopy [4]. This established tha t the structure of these films had much in common with tha t of the usual polymers produced by prior irradiation with fast electrons. This report deals with the work concerning the formation of polymer films in an a~mosphere of hexamethyldisiloxane vapour (HMDS), or of methylmethoxysilane (MMOS) of general formula (CH3)nSi(OCHa)~. n (n----0, 1, 2, 3) on the surface of aluminium due to a glow discharge. The investigation dealt with the growth rate of the film as a function of H ~ D S vapour pressure in the system, the current intensity of the discharge and the polymerization time; the infrared spectra of the films were taken, the influence of adding argon was observed, and also tha t the number of methoxy groups on the Si-atom of the starting comp o u n d on the properties and structure of the films.