Abstract
Abstract Thin fluoropolymer films deposited in an r.f. discharge fed with C 2 F 6 H 2 mixtures were studied. The effect of the electrical characteristics, the substrate temperature and the feed composition on both the chemical structure of the film and on the growth mechanism were analysed. It was found, in particular, that the structure of the film is affected by the H 2 concentration in the feed and by the discharge voltage and current values and that the polymerization rate decreases with temperature after a threshold.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
