Polycrystalline silicon precipitates on SiO 2 using an argon excimer laser

Abstract

We are developing an argon excimer laser which oscillates at 126 nm (9.8 eV). Since the photon energy of the laser is as high as 9.8 eV, the laser can induce bond breaking in most of materials without any reactive gas or solution. We performed irradiation of an argon excimer laser on crystal and glass SiO 2, and then investigated the surfaces by means of X-ray photoelectron spectroscopy, Raman scattering, X-ray diffraction and reflection of high energy electron diffraction measurements. The results indicate that polycrystalline silicon precipitates on the surface with a preferential orientation.