Polycrystalline diamond CVD-synthesis on modified silicon substrates from methane-hydrogen plasma

Abstract

The widespread use of diamond in electronics, photonics and other fields of science and technology is currently constrained by the possibility of obtaining high-quality material – polycrystalline diamond CVD-films on silicon, molybdenum, copper and other materials, as well as a small deposition area. Substrates special pretreatment will allow solving both problems. This paper presents the results of the synthesis of several types of polycrystalline diamond film (light-gray, gray and dark-gray) on a modified silicon substrate. We discuss the technical aspects of modifying silicon substrate surface and the synthesis parameters of each type of film. The results obtained in this work allow in the future significantly increase the geometric dimensions of deposited diamond films without reducing their quality, which will make it possible to use them as optical windows.