Abstract
AbstractPoly(hydrosilane)s, [R(H)Si]n [R = Ph, Si(CH2)3SiMe2Th, cy‐Hex], are investigated as sources of silyl radicals. The Si–H bonds in these oligomers exhibit good to excellent hydrogen donating properties which ensure the formation of reactive silyl radicals. For free radical photopolymerization, the polymerization initiating properties of these structures are checked. These polymers are found to be advantageous to overcome the classical oxygen inhibition of the FRP process. Their ability in FRPCP is also evaluated for an epoxy monomer. The mechanisms are investigated through ESR and laser flash photolysis experiments. magnified image
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
