Abstract
Imprinting of anisotropic structures on the silicon surface by double pulse femtosecond laser irradiation is demonstrated. The origin of the polarization-induced anisotropy is explained in terms of interaction of linearly polarized second pulse with the wavelength-sized symmetric crater-shaped structure generated by the linearly polarized first pulse. A wavefront sensor is fabricated by imprinting an array of micro-craters. Polarization controlled anisotropy of the structures can be also explored for data storage applications.
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