Abstract
Nanometer scale mechanical properties of extremely thin DLC films deposited by filtered cathodic vacuum arc (FCVA) and electron cyclotron resonance chemical vapor deposition (ECR-CVD) methods were evaluated. DLC films, whose target thicknesses are 100nm, 5nm, and 2nm were, deposited on Si (100) substrates by FCVA and ECR-CVD method. Nanoindentation hardness and nanowear resistance of these DLC films are investigated by AFM (Atomic force microscopy). Nanoindentation hardness of 100-nm-thick DLC films deposited by FCVA and ECR-CVD is 57GPa and 25GPa, respectively. The nanowear resistance of 5nm- or 2nm-thick DLC films can be evaluated by AFM at proper load conditions. Then nanowear test reveal the excellent wear resistance of the FCVA-DLC films.
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