Abstract
ZnO thin films are deposited on sapphire (0001) substrates by a high-purity ZnO target and a pulsed Nd:YAG laser with a wavelength of 355 nm.The structural,optical and electrical properties of ZnO thin films are grown and investigated in various substrate temperatures.The morphological propertie of the films is analyzed by atomic force microscopy (AFM).The optical properties and electrical properties of the films are investigated by Raman scattering and ultraviolet photoluminescence (PL) emission and FTIR Hall-effect measurements,respectively.The results of the temperature of the substrate is a highly important parameter to influence the film morphology and films grown,and the high quality crystallinity has an excellent UV emission at 500 ℃.
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