Abstract

Graphene monolayer of sub-nanometer thickness possesses strong metallic and plasmonic behavior in a broad terahertz (THz) frequency range. This plasmonic effect can be considerably manipulated when graphene layer is subjected to a variable chemical potential (Ef) via chemical doping or electrical gating. The strong adsorption characteristics of graphene layer is another important advantage. In this work, a photonic spin Hall effect (PSHE) based plasmonic sensor consisting of germanium prism, organic dielectric layer, and graphene monolayer is simulated and analyzed in THz range aiming at highly sensitive and reliable gas sensing. Modified Otto configuration and Kubo formulation for graphene at room temperature are considered. The sensor’s performance is examined in terms of figure of merit (FOM). The analysis indicates that under angular interrogation scheme of sensor operation, the FOM improves for smaller chemical potential (moderate doping) and higher THz frequency. Moreover, the influence of temperature on gas sensor’s performance (FOM) is negligible, which suggests that the sensor is capable of providing stable sensing performance against temperature variation. The sensor design is highly flexible in terms of selection of THz frequency as an alternative interrogation scheme (i.e., measuring the variation in spin-dependent shift peak value of PSHE spectrum upon change in gas medium refractive index) can also be implemented. It is found that there is no need to change the moderate doping of graphene monolayer (i.e., Ef remains around its normal value ~ 0.1 eV) as the sensitivity achievable with this alternative method has considerably greater magnitude at smaller THz frequency (e.g., 2 THz). The magnitudes of FOM (with angular interrogation method) and sensitivity (with alternative method) are found to be significantly greater for rarer gaseous media, which might possibly assist in early detection of airborne viruses such as SARS-Cov-2 (while using appropriate specificity method) and to measure the concentration of a particular gas in a given gaseous mixture.Supplementary InformationThe online version contains supplementary material available at 10.1007/s11082-022-03626-7.

Full Text
Published version (Free)

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call