Plasmonic noise in silicon nanolayers

Abstract

We report a microscopic investigation of the spectrum of voltage fluctuations in nanometric n-Si layers. Theory makes use of a Monte Carlo simulator self-consistently coupled with a two-dimensional Poisson solver. We consider layers of variable thickness W in the range of 2–100 nm and variable length L in the range of 10–1000 nm embedded in an external dielectric medium. Calculations are performed at T=300 K for different doping levels and in the presence of an applied voltage of increasing strength. The spectra are found to exhibit peaks centered on the terahertz region. For W≥100 nm and carrier densities of 5×1017 and 5×1018 cm−3, the frequency peaks agree with the value of the three dimensional plasma frequency. For W≤100 nm, the results exhibit a plasma frequency that depends on L, thus implying that the oscillation mode is dispersive. The corresponding frequency covers a wide range of values of 0.2–10 THz and is in agreement with the values of the two-dimensional plasma frequency predicted by existing analytical models. At sufficiently high voltages, the two-dimensional plasma peak is washed out and we observe the onset of a peak in the subterahertz region which is associated with transit time instabilities induced by current saturation conditions.